Waveguide patterning by Directly UV-written trenches

F. Knappe, G. Girard, B. Poumellec, J.-E. Bourée, D. Dragoe, E. Billi, H. Renner, E. Brinkmeyer,
Waveguide patterning by Directly UV-written trenches
Conference on Bragg Gratings, Poling and Photosensitivity (BGPP), Sydney, Australia , pp. 210-212 (2005)

Abstract: Germanium doped silica layers deposited by Matrix Distributed Electron Cyclotron Resonance exhibit a large negative photosensitivity. Using a focussed 244nm UV-laser we observed index changes down to -1x10-2

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