Scanning Phase-Mask DUV Inscription of Short-Period Large-Area Photoresist Gratings

Scanning Phase-Mask DUV Inscription of Short-Period&nbs

J. Huster, Jost Müller, H. Renner, E. Brinkmeyer,
Scanning Phase-Mask DUV Inscription of Short-Period Large-Area Photoresist Gratings
J. Lightwave Technol. 29(17), pp. 2621-2628 (2011)

Abstract: We present an approach for periodical structuring of large-area photoresist gratings with short periods based on a deep-ultraviolet (DUV) lithography process. Our procedure of inscribing gratings on planar surfaces using a scanning phasemask interferometer and including a technique for suppressing the disturbing influence of the zeroth-order diffraction is demonstrated and compared to well-established methods. Applying this approach, large-area, centimeter-scale chirped photoresist gratings with a central period of 225 nm, a chirp rate of 0.5 nm/cm and a duty cycle of 50 % have been fabricated on planar silicon chips.

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